Controlled and precise heating during the production of high-performance semiconductors

Diffusion is a thermally controlled process. This requires a precise heating system.

SCHUPP^® will gladly develop together with you a MolyTec heating system for the controlled and precise heat treatment of semiconductors. We combine high-purity heating elements of molybdenum disilicide (MoSi₂) and vacuum-formed insulation parts UltraVac of non-classified polycrystalline mullite/alumina wool (PCW) according to your requirements. Our heating systems allow process temperatures even up to 1450°C (strongly depending on application and geometry).

The most important influences in the semiconductor industry are temperature and time. Use of MolyTec heating systems permits shortening of the process time by higher process temperatures as compared to wire. Additionally, the system forms a homogeneous temperature distribution and higher performance introduction by MoSi₂ heating elements as compared to alternative heating solutions. Fast and uncomplicated installation reduces long maintenance failures. The high-quality components of the heating system lead to a longer service life than that of conventional heating systems (e.g. with wire).

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